Direct Filtration of a Semiconductor Wastewater

by Anthony G. Collins, Clarkson Univ, Dep of Civil &, Environmental Engineering, Potsdam, NY, USA,
James K. Edzwald, Clarkson Univ, Dep of Civil &, Environmental Engineering, Potsdam, NY, USA,
Steven C. Hearl, Clarkson Univ, Dep of Civil &, Environmental Engineering, Potsdam, NY, USA,
Thomas A. Tamayo, Clarkson Univ, Dep of Civil &, Environmental Engineering, Potsdam, NY, USA,



Document Type: Proceeding Paper

Part of: Environmental Engineering

Abstract: A pilot plant study was conducted to determine the feasibility of direct filtration for the removal of metal precipitates from a semiconductor manufacturing wastewater. The pH of the acidic wastewater was adjusted into the range of 6 to 8. 5 to induce metal precipitation. Jar tests were used to assist in the selection of chemical conditions for pilot plant operation. The physical and chemical parameters evaluated during pilot plant experiments were pH, lime and caustic soda addition for pH adjustment, polymer type and dose, and dual and anthracite filter media. Effluent metal concentrations, turbidity and head loss were monitored. The pilot plant results showed that operation at pH near 8. 5 with a dual media filter provided the best effluent quality. Filter run duration was relatively short before breakthrough occurred for all conditions evaluated. The sludge volume generated by the direct filtration process was significantly less than that presently generated by a conventional upflow clarification process. (Edited author abstract. )

Subject Headings: Wastewater management | Metals (chemical) | pH | Filters | Industrial facilities | Wastewater treatment plants | Feasibility studies

Services: Buy this book/Buy this article

 

Return to search